Aluminium oxide formation via atomic layer deposition using a polymer brush mediated selective infiltration approach

Area selective deposition (ASD) is an emerging method for the patterning of electronic devices as it can significantly reduce processing steps in the industry. A potential ASD methodology uses infiltration of metal precursors into patterned polymer materials. The work presented within demonstrates t...

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その他の著者:	Snelgrove, Matthew, Mani Gonzalez, Pierre Giovanni, McFeely, Caitlin, Lahtonen, K, Lundy, Ross, Hughes, Greg, Valden, M, McGlynn, Enda, Yadav, Pravind, Saari, J, Morris, Mike A, O Connor, Robert
フォーマット:	Artículo
言語:	English
出版事項:	2020
主題:	Polymer, ASD info:eu-repo/classification/cti/7
オンライン･アクセス:	https://doi.org/10.1016/j.apsusc.2020.145987 https://www.sciencedirect.com/science/article/pii/S0169433220307431
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Aluminium oxide formation via atomic layer deposition using a polymer brush mediated selective infiltration approach

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