Sputtering power e ects on the electrochromic properties of NiO lms

The effect of sputtering power (=60 W–180 W) on the electrochromic properties of nickel oxide films deposited on ITO-coated glass substrates by the radio frequency magnetron sputtering technique was investigated. Crystalline structure and morphology were assessed by X-ray diffraction and scanning el...

Deskribapen osoa

Gorde:
Xehetasun bibliografikoak
Beste egile batzuk: Abenuz Acuña, Juan Ruben, Perez, Israel, Elizalde Galindo, Jose Trinidad, Farias, Rurik, CARRILLO FLORES, DIANA MARÍA, Enriquez Carrejo, Jose Luis, Burrola Gándara, Luis Andrés, Mani Gonzalez, Pierre Giovanni, Sosa, Victor, Gamboa, Fidel
Formatua: Artículo
Hizkuntza:en_US
Argitaratua: 2021
Gaiak:
Sarrera elektronikoa:https://doi.org/10.1016/j.ijleo.2021.166509
https://www.sciencedirect.com/science/article/abs/pii/S0030402621002370
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