Sputtering power e ects on the electrochromic properties of NiO lms
The effect of sputtering power (=60 W–180 W) on the electrochromic properties of nickel oxide films deposited on ITO-coated glass substrates by the radio frequency magnetron sputtering technique was investigated. Crystalline structure and morphology were assessed by X-ray diffraction and scanning el...
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| Další autoři: | , , , , , , , , , |
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| Médium: | Artículo |
| Jazyk: | en_US |
| Vydáno: |
2021
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| Témata: | |
| On-line přístup: | https://doi.org/10.1016/j.ijleo.2021.166509 https://www.sciencedirect.com/science/article/abs/pii/S0030402621002370 |
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