Influence of post‑deposition annealing on the chemical states of crystalline tantalum pentoxide films

Influence of post‑deposition annealing on the chemical states of crystalline tantalum pentoxide films

We investigate the effect of post-deposition annealing (for temperatures from 848 K to 1273 K) on the chemical properties of crystalline Ta2O5 films grown on Si(100) substrates by radio frequency magnetron sputtering. The atomic arrangement, as determined by X-ray diffraction, is predominately hexag...

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书目详细资料
主要作者:	Perez, Israel
其他作者:	Sosa, Victor, Gamboa, Fidel, Elizalde Galindo, Jose Trinidad, Mani Gonzalez, Pierre Giovanni, Farias, Rurik, Enriquez Carrejo, Jose Luis
格式:	Artículo
语言:	en_US
出版:	2018
主题:	XPS Sputtering Tantalum Pentoxide info:eu-repo/classification/cti/1
在线阅读:	https://doi.org/10.1007/s00339-018-2198-9 https://doi.org/10.1007/s00339-018-2198-9
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