Aluminium oxide formation via atomic layer deposition using a polymer brush mediated selective infiltration approach
Area selective deposition (ASD) is an emerging method for the patterning of electronic devices as it can significantly reduce processing steps in the industry. A potential ASD methodology uses infiltration of metal precursors into patterned polymer materials. The work presented within demonstrates t...
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| その他の著者: | , , , , , , , , , , , |
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| フォーマット: | Artículo |
| 言語: | English |
| 出版事項: |
2020
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| 主題: | |
| オンライン･アクセス: | https://doi.org/10.1016/j.apsusc.2020.145987 https://www.sciencedirect.com/science/article/pii/S0169433220307431 |
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