Aluminium oxide formation via atomic layer deposition using a polymer brush mediated selective infiltration approach

Aluminium oxide formation via atomic layer deposition using a polymer brush mediated selective infiltration approach

Area selective deposition (ASD) is an emerging method for the patterning of electronic devices as it can significantly reduce processing steps in the industry. A potential ASD methodology uses infiltration of metal precursors into patterned polymer materials. The work presented within demonstrates t...

Full description

Saved in:
Bibliographic Details
Other Authors: Snelgrove, Matthew, Mani Gonzalez, Pierre Giovanni, McFeely, Caitlin, Lahtonen, K, Lundy, Ross, Hughes, Greg, Valden, M, McGlynn, Enda, Yadav, Pravind, Saari, J, Morris, Mike A, O Connor, Robert
Format: Artículo
Language:English
Published: 2020
Subjects:
Polymer, ASD
info:eu-repo/classification/cti/7
Online Access:https://doi.org/10.1016/j.apsusc.2020.145987
https://www.sciencedirect.com/science/article/pii/S0169433220307431
Tags: Add Tag
No Tags, Be the first to tag this record!
Be the first to leave a comment!
You must be logged in first

Similar Items