Aluminium oxide formation via atomic layer deposition using a polymer brush mediated selective infiltration approach

Area selective deposition (ASD) is an emerging method for the patterning of electronic devices as it can significantly reduce processing steps in the industry. A potential ASD methodology uses infiltration of metal precursors into patterned polymer materials. The work presented within demonstrates t...

Descripción completa

Guardado en:

Detalles Bibliográficos
Otros Autores:	Snelgrove, Matthew, Mani Gonzalez, Pierre Giovanni, McFeely, Caitlin, Lahtonen, K, Lundy, Ross, Hughes, Greg, Valden, M, McGlynn, Enda, Yadav, Pravind, Saari, J, Morris, Mike A, O Connor, Robert
Formato:	Artículo
Lenguaje:	English
Publicado:	2020
Materias:	Polymer, ASD info:eu-repo/classification/cti/7
Acceso en línea:	https://doi.org/10.1016/j.apsusc.2020.145987 https://www.sciencedirect.com/science/article/pii/S0169433220307431
Etiquetas:	Agregar Etiqueta Sin Etiquetas, Sea el primero en etiquetar este registro!

Sea el primero en dejar un comentario!

Aluminium oxide formation via atomic layer deposition using a polymer brush mediated selective infiltration approach

Ejemplares similares